| Ementa/Descrição: |
Microfabrication processes in CMOS and BJT technologies;
Applications of microfabrication technologies;
Description of steps in microfabrication processes (sample cleaning, oxidation, photolithography, ion diffusion and implantation, film deposition and growth, wet and dry etching);
Characterization of materials and process steps (wafer's thickness measurements, type of semiconductor conductivity, sheet resistance and resistivity, electrical measurements in semiconductors);
Characterization techniques for microelectronics (AES - Auger Electron Spectroscopy, SEM - Scanning Electron Microscopy, SIMS - Second Ion Mass Spectroscopy, TEM - Transmission Electron Microscopy, photoluminescence, infrared spectroscopy, ellipsometry, interferometry, optical microscopy) |
| Referências: |
Principal:
Introduction to Microfabrication, 2nd Edition, Sami Franssila, Wiley, 2010
ISBN-13: 978-0470749838, ISBN-10: 0470749830
Complementar:
Silicon VLSI Technology: Fundamentals, Practice and Modeling, J. D. Plummer, M. D. Deal, P. B. Griffin, Prentice Hall, 2000, ISBN-10: 0130850373
Silicon Processing for the VLSI Era, Vol.2 - Process Integration, S. Wolf and R. N. Tauber, Lattice Press, 1990, ISBN: 0961672145
Silicon Processing for the VLSI Era, Vol.1 - Process Technology, S. Wolf and R. N. Tauber, Lattice Press, 1986, ISBN: 9780961672164 |
